TY - JOUR
T1 - Plant responses to changing environmental stress
T2 - Cyclobutyl pyrimidine dimer repair in soybean leaves
AU - Sutherland, Betsy M.
AU - Takayanagi, Shinnosuke
AU - Sullivan, Joe H.
AU - Sutherland, John C.
PY - 1996/9
Y1 - 1996/9
N2 - We have determined the capacity of soybean seedlings to repair DNA damage by UV doses that do not produce apparent injury in the plants. They remove cyclobutane pyrimidine dimers by both excision and photoreactivation. The rates and relative contributions of these repair processes were determined as a function of initial level of cyclobutyl pyrimidine dimers. Photoreactivation was detected in seedlings at all initial dimer levels. Although excision was not observed at the lowest dimer frequencies, at higher initial dimer levels it was quite effective in dimer removal. The rates of repair in soybean were substantially higher than in alfalfa seedlings at the same DNA damage levels.
AB - We have determined the capacity of soybean seedlings to repair DNA damage by UV doses that do not produce apparent injury in the plants. They remove cyclobutane pyrimidine dimers by both excision and photoreactivation. The rates and relative contributions of these repair processes were determined as a function of initial level of cyclobutyl pyrimidine dimers. Photoreactivation was detected in seedlings at all initial dimer levels. Although excision was not observed at the lowest dimer frequencies, at higher initial dimer levels it was quite effective in dimer removal. The rates of repair in soybean were substantially higher than in alfalfa seedlings at the same DNA damage levels.
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U2 - 10.1111/j.1751-1097.1996.tb03092.x
DO - 10.1111/j.1751-1097.1996.tb03092.x
M3 - Article
AN - SCOPUS:0030462511
SN - 0031-8655
VL - 64
SP - 464
EP - 468
JO - Photochemistry and Photobiology
JF - Photochemistry and Photobiology
IS - 3
ER -