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Light-induced ultrafast phase transitions in VO 2 thin film

  • S. Lysenko
    ,
  • A. J. Rua
    ,
  • V. Vikhnin
    ,
  • J. Jimenez
    ,
  • F. Fernandez
    ,
  • H. Liu(corresponding author)
*Corresponding author for this work
  • University of Puerto Rico-Mayaguez
Scholary Output:
Contribution to journal
Article
Peer-review

Abstract

Vanadium dioxide shows a passive and reversible change from a monoclinic insulator phase to a metallic tetragonal rutile structure when the sample temperature is close to and over 68 °C. As a kind of functional material, VO 2 thin films deposited on fused quartz substrates were successfully prepared by the pulsed laser deposition (PLD) technique. With laser illumination at 400 nm on the obtained films, the phase transition (PT) occurred. The observed light-induced PT was as fast as the laser pulse duration of 100 fs. Using a femtosecond laser system, the relaxation processes in VO 2 were studied by optical pump-probe spectroscopy. Upon a laser excitation an instantaneous response in the transient reflectivity and transmission was observed followed by a relatively longer relaxation process. The alteration is dependent on pump power. The change in reflectance reached a maximum value at a pump pulse energy between 7 and 14 mJ/cm 2 . The observed PT is associated with the optical interband transition in VO 2 thin film. It suggests that with a pump laser illuminating on the film, excitation from the d θ,ε - state of valence band to the unoccupied excited mixed d θ,ε -π* - state of the conduction band in the insulator phase occurs, followed by a resonant transition to an unoccupied excited mixed d θ,ε -π* - state of the metallic phase band.

Publication Information

Output type

Scholary Output:
Contribution to journal
Article
Peer-review

Original language

English (US)

Pages from-to (Number of pages)

Pages 5512-5515 (4 pages)

Journal (Volume, Issue Number)

Applied Surface Science (Volume 252, Issue 15)

Publication milestones

  • Published - 05/30/2006

Publication status

Published - 05/30/2006

ISSN

0169-4332

Publication IDs

  • Scopus: 33744532102

Publication metrics

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Fractional count
1
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0.17
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5
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0.83
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1
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1
SciVal
citations
97
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FWCI
2.22
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Author count
6
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Paper percentile
94
SciVal
Top percentile
10
Scopus
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