Re-print of "sub-eV ion deposition utilizing soft-landing ion mobility for controlled ion, ion cluster, and charged nanoparticle deposition"
- Barbara L. Walton,
- William D. Hoffmann,
- Guido F. Verbeck(corresponding author)
- University of North Texas
Scholary Output:
Contribution to journal
Article
Peer-reviewAbstract
Sub-eV ion deposition via soft-landing ion mobility has been utilized for a variety of applications. It has allowed for the deposition of a dielectric material onto graphene without introducing defects into the lattice structure. This deposition technique has also been used for surface enhanced Raman studies. Deposited silver has also been used as an alternative MALDI matrix for low mass compounds and shows promise for imaging applications.
Publication Information
Output type
Scholary Output:
Contribution to journal
Article
Peer-reviewOriginal language
English (US)Pages from-to (Number of pages)
Pages 214-221 (8 pages)Journal (Volume, Issue Number)
International Journal of Mass Spectrometry (Volume 377, Issue 1)Publication milestones
- Published - 2015
Publication status
Published - 2015
ISSN
1387-3806Publication IDs
- Scopus: 85028202147
Publication metrics
Metrics
Fractional count
1
Fractional count
0.33
Fractional count
2
Fractional count
0.67
Fractional count
1
Fractional count
1
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Citation count
1
Captures
6
Funding Details
The authors would like to acknowledge SRC-Center for Electronic Materials Processing and Integration Grant 2017.015 , DOD-AFOSR-YIP Grant FA 9550-08-1-0153 , UNT-Center for Advanced Research and Technology , UNT-Laboratory of Imaging Mass Spectrometry , Dr. Thomas Scharf for help with the surface analyses, and Dr. Chapman for the cottonseed sections for initial method testing. The authors would also like to thank the Toulouse Graduate School at the University of North Texas for providing Barbara Walton with a fellowship to support her work.
FunderFunding numbers
Toulouse Graduate School at the University of North Texas for providing Barbara Walton
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