Variations of morphology of fluoropolymer thin films versus deposition conditions

Engineering & Materials Science

• Fluorine containing polymers 100%
• Polytetrafluoroethylenes 74%
• Thin films 61%
• Electrons 18%
• Evaporation 18%
• Plasmas 17%
• Chemical activation 16%
• Plasma deposition 15%
• Hardness 14%
• Chemical properties 10%
• Physical properties 8%
• Vacuum 8%
• Magnetic fields 8%
• Surface roughness 7%
• Coatings 6%
• Plastics 6%
• Polymers 6%
• Decomposition 6%
• Gases 5%
• Industry 4%

Physics & Astronomy

• fluoropolymers 90%
• polytetrafluoroethylene 80%
• thin films 33%
• radio frequencies 23%
• activation 14%
• hardness 14%
• evaporation 14%
• pretreatment 10%
• chemical properties 9%
• electrons 7%
• industries 7%
• roughness 7%
• physical properties 7%
• plastics 7%
• decomposition 7%
• coatings 6%
• vacuum 5%
• polymers 5%
• gases 4%
• magnetic fields 4%

Chemical Compounds

• Poly(tetrafluoroethylene) 67%
• Liquid Film 26%
• Plasma 17%
• Electron Particle 10%
• Magnetic Field 8%
• Evaporation 8%
• Vacuum 7%
• Industry 6%
• Surface 5%
• Coating Agent 5%
• Pressure 5%
• Gas 4%